Vacuum coating machine cathodic arc technology?

Vacuum coating machine cathodic arc technology?

Vacuum coating machine cathode arc technology using the vacuum arc discharge, the solid cathode evaporation, target material in the reinforcement, and through the plasma to fly to the anode substrate surface deposition film. Cathode arc is a typical high current (up to several hundred amperes) arc, arc to transmit the cathode material, in the form of plasma and ion current accounts for about 10% of the arc current. Because of this, the cathode arc technology has a very high deposition rate. Be away from the target material particles in the 60 to 100 ev average energy form high arousal of ion beam sputter out, in inert gas or vacuum deposition reaction gas on the surface of the matrix, has high energy ion beam to increase the film adhesion and disrupt the membrane structure of the columnar crystal is very beneficial, and thus can significantly improve the organizational structure and mechanical properties of the membrane. However, because of the cathode arc evaporation process is very fierce, and the sputtering process is relatively peaceful compared to the magnetron sputtering, cathode arc evaporation process will produce more harmful particles, this limits the cathode arc technology applied in need high quality surface.
At present, the thin film device manufacturers through the study of film forming principle and technology adopted various measures to reduce "droplets" : adopt unique arc source to meet the needs of industrial production and obtained a certain result, such as Aksenov and collaborators 90 ° bend type magnetic filter design; By controlling the reaction gas pressure change and with a pulse discharge limits the service life of the cathode spots, can be easily prepared at present widely used TiN, CrN, TiCN, CrTiAlN and DLC hard membrane. Swiss Balzers company is one of the world's largest tool membrane preparation company, is famous for its hot arc technology, it will be the basis of using original thermal arc technology magnetron sputtering and arc technology combined development BAI1200, RCS PVD equipment such as the cathode arc technology is given priority to, can also be additional source of magnetron sputtering deposition WC/C membrane.
BAI1200, RCS USES circular planar cathode source technology and radiation heating technology, can be quickly coating production. Balzers in 08 development BALINIT ARCTIC process, under the deposition temperature of 200 ℃ can be prepared at present three known high-performance nitrogen TiN coating, CrN and TiAlN. Using the technology of preparation of TiAlN can enhance the stability of machining tool cutting edge, its excellent heat resistance and chemical resistance to improve the performance of the high stress components, and have made it possible to dry cutting, high hardness of the coating has the excellent abrasion resistance and corrosion resistance.