2016年10月13日星期四

Characteristics of Vacuum Ion Coater Coating and Its Application

Characteristics of Vacuum Ion Coater Coating and Its Application
Ion coating machine and evaporation coating machine, sputtering coating machine, compared to the biggest feature is charged ions can bombard the substrate and the film side, while the deposition. The effects of the bombardment of charged ions can be attributed to a series of effects, mainly as follows:
 ① film / base adhesion (adhesion), the film is not easy to fall off. The substrate is cleaned, activated and heated by the ion bombardment of the substrate by sputtering, which removes both the adsorbed gas and contaminants from the substrate surface and the removal of oxides from the substrate surface. The heating and defects of the shovels during ion bombardment can cause the enhanced diffusion effect of the substrate. Not only improve the matrix surface layer of the organization of crystalline properties, but also provides the conditions for the formation of alloy phase. Moreover, higher energy ion bombardment, but also can produce a certain degree of ion implantation and ion beam mixing effect.
 ② ion coating machine as a result of good diffraction. At higher pressures (≧ 1 Pa) ions or molecules of ionized vapors will encounter multiple collisions of gas molecules before reaching the substrate. Therefore, the film material particles can be scattered around the substrate. Thereby improving the coverage of the film. Also, the ionized membrane ions are deposited at any location on the surface of the substrate with a negative voltage under the influence of the power plant. As a result, this is not possible with evaporative plating.
 ③ coating of high quality. As the ion bombardment can improve the density of the membrane to improve the structure of the membrane, making the film uniformity, coating dense, pinholes and bubbles less. As a result, the quality of the film layer is improved.
 ④ deposition rate is high, film speed, can be prepared 30μm thick film.
 ⑤ coating applied to the substrate material and film materials are more extensive. Applicable to metal or non-metallic surface coating of metal, compounds, non-metallic materials, film. Such as iron and steel, nonferrous metals, quartz, ceramics, plastics and other materials surface coating. Since the activity of the plasma is favorable for lowering the synthesis temperature of the compound, various kinds of quarternary compound films can be easily plated by ion plating.

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