Vacuum coating machine metal decorative film PVD coating system technology
PVD vacuum coating machine metal decorative film coating system technology, mainly in decorative product design. Such as large sheets, pipe, protective film coating on upholstery, vacuum coating equipment after coating products to show elegant, dazzling and other kinds of beautiful effects, and the film does not fade and wear resistance.
1. trim materials (substrates)
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(1) metal. Stainless steel, steel alloy, zinc-based alloys.
(2) glass, ceramics.
(3) plastic. ABS, PVC, PC, SHEET, nylon, crystal and so on.
(4) of a flexible material. Polyester film, PC, paper, cloth, foam, strips etc.
2. The types of decorative film
(1) a metal substrate decorative film layer: TiN, ZrN, TiC, CrNx, TiCN, CrCN, Ti02, Al and the like.
(2) glass, ceramic decorative coating: TiO2, Cr2O3, MgF2, ZnS and so on.
(3) decorative plastic substrate film: AI, Cu, Ni, Si02, Ti02, ITO, MgF2.
(4) decorative film flexible materials: Al, lTO, Ti02, ZnS, etc.
Vacuum coating machine plating bright chrome plated brass sanitary ware by magnetron sputter ion plating system ZrN film. Vacuum coating equipment using the base for zirconium unbalanced magnetron sputtering target and frequency power supply, power supply and pulse bias.
(1) vacuum
5 X 10-3 ~ 6.6 x 10-13Pa background vacuum. Vacuum coating equipment heating temperature should be in the vacuum chamber wall and then back up to deflate 100 ~ 150 ℃.
(2) Cleaning bombardment
Vacuum: Walter argon maintained at a vacuum of 2 ~ 3Pa. Bombardment voltage: 800 ~ 1000V, pulse duty cycle of 20%. Bombardment time: 10min.
(3) Coating
① zirconium layer deposition
Vacuum: purged with argon, the vacuum was maintained at sx l0-1Pa. Target Voltage: 400-550V, target power 15 N 30W / Crrr2. Pulsed Bias: 450 ~ 500V, 20% duty cycle. Coating time: 5 ~ 10min.
② plated ZrN films
Vacuum: nitrogen gas, the degree of vacuum is maintained at (3 ~ 5) x 10-1Pa. Target Voltage: 400 ~ 550V, target current increases with the increase of the target area. Pulsed Bias: 150 ~ 200V, 80% duty cycle. Coating time: 20 ~ 30min.
Because of the vacuum magnetron sputtering coating machine metal ionization rate, not easy reactive deposition, a relatively narrow range of technology to obtain a compound film. Vacuum coating equipment can be gas, the reaction gas from the ion source, expanding the range of reactive deposition process. The plasma arc can also be used as a source to produce columnar arc ionization source, columnar arc source or assisted deposition sources.
our company committed to the development and production of vacuum coating machines, vacuum coating equipment widely used in automotive, glass, plastics, electronics, watches, metal industries, products are widely sold worldwide, to provide customers with customized process solutions programs and machines,
(2) glass, ceramics.
(3) plastic. ABS, PVC, PC, SHEET, nylon, crystal and so on.
(4) of a flexible material. Polyester film, PC, paper, cloth, foam, strips etc.
2. The types of decorative film
(1) a metal substrate decorative film layer: TiN, ZrN, TiC, CrNx, TiCN, CrCN, Ti02, Al and the like.
(2) glass, ceramic decorative coating: TiO2, Cr2O3, MgF2, ZnS and so on.
(3) decorative plastic substrate film: AI, Cu, Ni, Si02, Ti02, ITO, MgF2.
(4) decorative film flexible materials: Al, lTO, Ti02, ZnS, etc.
Vacuum coating machine plating bright chrome plated brass sanitary ware by magnetron sputter ion plating system ZrN film. Vacuum coating equipment using the base for zirconium unbalanced magnetron sputtering target and frequency power supply, power supply and pulse bias.
(1) vacuum
5 X 10-3 ~ 6.6 x 10-13Pa background vacuum. Vacuum coating equipment heating temperature should be in the vacuum chamber wall and then back up to deflate 100 ~ 150 ℃.
(2) Cleaning bombardment
Vacuum: Walter argon maintained at a vacuum of 2 ~ 3Pa. Bombardment voltage: 800 ~ 1000V, pulse duty cycle of 20%. Bombardment time: 10min.
(3) Coating
① zirconium layer deposition
Vacuum: purged with argon, the vacuum was maintained at sx l0-1Pa. Target Voltage: 400-550V, target power 15 N 30W / Crrr2. Pulsed Bias: 450 ~ 500V, 20% duty cycle. Coating time: 5 ~ 10min.
② plated ZrN films
Vacuum: nitrogen gas, the degree of vacuum is maintained at (3 ~ 5) x 10-1Pa. Target Voltage: 400 ~ 550V, target current increases with the increase of the target area. Pulsed Bias: 150 ~ 200V, 80% duty cycle. Coating time: 20 ~ 30min.
Because of the vacuum magnetron sputtering coating machine metal ionization rate, not easy reactive deposition, a relatively narrow range of technology to obtain a compound film. Vacuum coating equipment can be gas, the reaction gas from the ion source, expanding the range of reactive deposition process. The plasma arc can also be used as a source to produce columnar arc ionization source, columnar arc source or assisted deposition sources.
our company committed to the development and production of vacuum coating machines, vacuum coating equipment widely used in automotive, glass, plastics, electronics, watches, metal industries, products are widely sold worldwide, to provide customers with customized process solutions programs and machines,
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