Vacuum plating equipment vacuum plating process

 

Vacuum plating is different from water plating a new technology, it is relatively environmentally friendly plating technology.

Vacuum plating process including vacuum deposition, sputtering, ion plating and the like.

Vacuum deposition:

Vacuum vapor deposition under vacuum conditions material is heated, the film-forming material is placed in a vacuum evaporating or sublimating, so that one surface of the substrate during the deposition process or a multilayer film.

The principle is that the temperature reaches the evaporation temperature of the coating material, the transfer of the generated steam from the vacuum chamber to condense on the cold part, will not be oxidized in a vacuum environment, be noted that the material for vacuum deposition to take into account melting and boiling points.

Cheap cathode plating:

Cathode base plating also called magnetron sputtering, an inert gas is generated by glow discharge plasma of the metal target atoms blasted deposition process on the substrate, the cathode base plating process requires a degree of vacuum of 1.3 * 10-3Pa . In the cathode target surface orthogonal electromagnetic field, plating base film adhesion than vacuum evaporation, is a high technology vacuum coating technology usage.

Ion Plating:

Ion plating under ion bombardment gas ions or substances deposited on the surface of the substrate method, ion plating is a new invention, the vacuum coating technique, ion plating process, although also in a vacuum chamber to achieve, but the coating process is performed by the charge transfer form, it has a strong penetration, you can enter the required coating system has a very strong base inside adhesion.

Vacuum plating is a physical method, coating is built under a vacuum environment, vacuum plating process is already a mature technology, the industry needs basically coated products can use vacuum coating.